Advances in resist technology and processing XXIII (20-22 February 2006, San Jose, California, USA)Lin, Qinghuang.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, pagination multiple, isbn 0-8194-6196-2Conference Proceedings

A study of process extension technologiesKIM, Sang-Kon.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193X.1-65193X.6, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

The tri-lateral challenge of resolution, photospeed, and LER : Scaling below 50nm?BRISTOL, R. L.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190W.1-65190W.11, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

New development application method to improve critical dimension controlHONG, Chang-Young.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 615338.1-615338.11Conference Paper

Study of iso/dense bias of BARCs and gap-fill materials on via wafersRUNHUI HUANG.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61532M.1-61532M.8Conference Paper

Lithography beyond 32nm : A role for imprint?MELLIAR-SMITH, Mark.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6638-9, Part I, xxiii-xxxviConference Paper

Rework/stripping of multilayer materials for FEOL and BEOL integration using single wafer tool techniquesTURNER, Stephen.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65192Q.1-65192Q.9, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

The application of high refractive index photoresist for 32nm device level imagingCONLEY, Will.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190Q.1-65190Q.8, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Enhancing photoresist performance with an adhesion promoting photo-acid generatorSHARMA, Shalini; MEAGLEY, Robert P.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190K.1-65190K.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Poly(4-(1-hydroxyalkyl)styrene based photoresist materials : Design, synthesis and their lithographic performanceNASRULLAH, Mohammed J; DHAMODHARAN, R.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61532F.1-61532F.8Conference Paper

Self assembly in semiconductor microelectronics : Self-aligned sub-lithographic patterning using diblock copolymer thin filmsBLACK, C. T; RUIZ, R.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 615302.1-615302.11Conference Paper

A novel 248-nm wet-developable BARC for trench applicationsNEEF, Charles J; THOMAS, Deborah.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65192Z.1-65192Z.8, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Thin bilayer resists for 193nm and future photolithography IIHISHIRO, Yoshi; HYATT, Michael.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651935.1-651935.12, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Thin bilayer resists approach for 193nm and future photolithographyHISHIRO, Yoshi; HYATT, Michael.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61532W.1-61532W.10Conference Paper

Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithographyHINSBERG, William; HOULE, Frances A.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 615303.1-615303.11Conference Paper

Everything you ever wanted to know about why the semiconductor industry needs a high refractive index photoresist...But were afraid to ask, part 1CONLEY, Will; SOCHA, Robert.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61531L.1-61531L.9Conference Paper

Adamantane based molecular glass resist for 193 nm lithographyTANAKA, Shinji; OBER, Christopher K.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61532B.1-61532B.12Conference Paper

Dissolution behavior of resist polymers studied by quartz-crystal-microbalance method IITORIUMI, Minoru; OKABE, Fumihiko; KITAYAMA, Masahiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651913.1-651913.7, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Novel photodefinable low-k dielectric polymers based on polybenzoxazinesROMEO, Michael; YAMANAKA, Kazuhiro; MAEDA, Kazuhiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65191K.1-65191K.7, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Printing of structures less than 0.3um by I-line exposure using resists TDMR-AR80 und TDMR-AR95BEHRENDT, A; DOW, T; STOEFLIN, K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193J.1-65193J.8, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Effect of top coat and resist thickness on line edge roughnessSINGH, Lovejeet; MATTHEW, Itty; PAWLOSKI, Adam et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61530W.1-61530W.12Conference Paper

Effects of material design on extreme ultraviolet (EUV) resist outgassingDEAN, Kim R; GONSALVES, Kenneth E; THIYAGARAJAN, Muthiah et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61531E.1-61531E.9Conference Paper

Novel low-dielectric constant photodefinable polyimides for low-temperature polymer processingYAMANAKA, Kazuhiro; ROMEO, Michael; MAEDA, Kazuhiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61531H.1-61531H.11Conference Paper

New developer-soluble gap-fill material with fast plasma etch rateANWEI QIN; SULLIVAN, Daniel M; RUNHUI HUANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61532T.1-61532T.8Conference Paper

Gas-phase fluorination of resist for improving line-end pullback during etchPETERS, Richard D; MONTGOMERY, Patrick K; STOUT, Phillip J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61532X.1-61532X.11Conference Paper